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Säntis 300

Full Wafer Cathodoluminescence Microscope

The Säntis 300 is an automated process control system for wafers up to 300 mm, offering large field-of-view, fast scanning, and simultaneous SEM imaging and CL spectra acquisition.

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Characteristics

About our Full Wafer Cathodoluminescence-SEM Equipment

The system's quantitative CL technology offers unparalleled speed, accuracy, and repeatability with a large 300 μm field of view. Multiple acquisition modes enable detailed defect analysis, material inhomogeneity mapping, and dynamic process tracking, such as dopant activation or elemental fluctuations.

Small-diameter wafers and miscellaneously-shaped substrates can be manually affixed to larger susceptors for automated handling by the tool, making the Säntis 300 well-suited to failure analysis and research applications where quick turnaround time is important.

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Features

About our Full Wafer Cathodoluminescence Microscope

The standard Säntis 300 configuration includes a top-loading loadlock into which wafers are manually placed using a wafer wand. The loadlock facilitates quick loading and unloading operations, increasing throughput compared to our Allalin system. The tool can be upgraded to include support for wafer cassettes (FOUPs) or even a full EFEM with automated wafer handling for integration in fully-automated fabs.

  • Fully automated quantitativeCL metrology
  • Simultaneous SEM imaging & spectra acquisition
  • High throughput & automated wafer handling
  • Wafer bow mapping & alignment
  • Loadlock for fast sample exchange
  • Loadlock for rapid sample loading and unloading

System Configurations: Includes manual or automated loading options for enhanced throughput, with potential upgrades for full automation. It is optimized for cleanroom environments and equipped with height mapping sensors to maintain precision during measurements.

Trusted by top semiconductor companies and prestigious research institutes worldwide

Applications

Related Applications Using the Säntis 300

Discover how the Allalin platform can support your research.

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Process development
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Materials Science
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Micro/Nanowire
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GaN device
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Life Science
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Power electronics
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Optoelectronics
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Application

Non-destructive quality control of micron-sized light emitting diodes

We will show how spectrally resolved quantitative CL can address this challenge.
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Application

Comprehensive defect review and classification for SiC

We show how spectrally-resolved quantitative CL can be used to classify various defects in SiC
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Non-destructive control of epitaxial layer uniformity in GaN power devices

We will show how spectrally-resolved quantitative CL can address this challenge
References

Scientific references in link with our Full Wafer Cathodoluminescence Microscope

Observation of Strong Coupling between an Inverse Bowtie Nano-Antenna and a Single J-aggregate WEISSMAN, A., SHUKHAREV, M., SALOMON, A. arXiv preprint, 2021 2021
Anisotropic and low damage III-V/Ge heterostructure etching for multijunction solar cell fabrication with passivated sidewalls DE LAFONTAINE, M., PARGON, E., GAY, G., PETIT-ETIENNE, C., DAVID, S., BARNES, J.-P., ROCHAT, N., JAOUAD, A., VOLATIER, M., FAFARD, S., AIMEZ, V., DARNON, M. Micro and Nano Engineering, 2021, 100083 2021
Nanoscale modification of WS2 trion emission by its local electromagnetic environment BONNET, N., LEE, H.Y., SHAO, F., WOO, S.Y., BLAZIT, J.-D., WATANABE, K., TANIGUCHI, T., ZOBELLI, A., STEPHAN, O., KOCIACK, M., GRADECAK-GARAJ, S., TIZEI, L.H.G. Nano Lett., 2021, 21, 24, 10178–10185 2021
Investigation of sidewall damage induced by reactive ion etching on AlGaInP MESA for micro-LED application BOUSSADI, Y., ROCHAT, N., BARNES, J.-P., BEN BAKIR, B., FERRANDIS, P., MASENELLI, B., LICITRA, C. Journal of Luminescence, 2021, 117937 2021

Ready to revolutionize your materials characterization approach?

Get in touch with us today to discover how our state-of-the-art cathodoluminescence tools can elevate your research and industry applications.
Already more than 30 systems installed globally!